Alternative lithographic technologies II (23-25 February 2010, San Jose, California, United States)Herr, Daniel J. C.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7637, issn 0277-786X, isbn 978-0-8194-8051-4 0-8194-8051-7, 1 online resource, isbn 978-0-8194-8051-4 0-8194-8051-7Conference Proceedings

Optical microlithography XXIII (23-25 February 2010, San Jose, California, United States)Dusa, Mircea V; Conley, Willard.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7640, issn 0277-786X, isbn 978-0-8194-8054-5 0-8194-8054-1, 2 vol, 2, isbn 978-0-8194-8054-5 0-8194-8054-1Conference Proceedings

Decomposition Analysis of Molecular Resists to further CD controlSHIONO, Daiju; HADA, Hideo; HIRAYAMA, Taku et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7273, issn 0277-786X, isbn 978-0-8194-7526-8 0-8194-7526-2, 727330.1-727330.8, 2Conference Paper

Optical microlithography XXII (24-27 February 2009, San Jose, California, United States)Levinson, Harry J; Dusa, Mircea V.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7274, issn 0277-786X, isbn 978-0-8194-7527-5 0-8194-7527-0, 2 vol, 2, isbn 978-0-8194-7527-5 0-8194-7527-0Conference Proceedings

Advances in OPC Technology and Development of ZOPC ToolXIAOLANG YAN; ZHENG SHI; YE CHEN et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, Vol 6827, pp 68271U.1-68271U.14, issn 0277-786X, isbn 978-0-8194-7002-7 0-8194-7002-3, 1VolConference Paper

Process sizing aware flow for yield calculationYUAN, Chi-Min.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7641, issn 0277-786X, isbn 978-0-8194-8055-2 0-8194-8055-X, 76410E.1-76410E.8Conference Paper

Lithography Asia 2009 (18-19 November 2009, Taipei, Taiwan)Chen, Alek C.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7520, issn 0277-786X, isbn 978-0-8194-7909-9 0-8194-7909-8, 1 vol, isbn 978-0-8194-7909-9 0-8194-7909-8Conference Proceedings

Lithography Cycle Time Improvements Using Short-Interval SchedulingNORMAN, David; WATSON, Scott; ANDERSON, Michael et al.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7640, issn 0277-786X, isbn 978-0-8194-8054-5 0-8194-8054-1, 76403B.1-76403B.9, 2Conference Paper

CP based EBDW throughput enhancement for 22nm high volume manufacturingMARUYAMA, Takashi; MACHIDA, Y; SUGATANI, S et al.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7637, issn 0277-786X, isbn 978-0-8194-8051-4 0-8194-8051-7, 76371S.1-76371S.8Conference Paper

Double Patterning Lithography Study with High Overlay AccuracyKIKUCHI, Takahisa; SHIRATA, Yosuke; YASUDA, Masahiko et al.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7640, issn 0277-786X, isbn 978-0-8194-8054-5 0-8194-8054-1, 76400H.1-76400H.9, 2Conference Paper

A study of mask inspection method with pattern priority and printability checkTOKITA, Masakazu; TSUCHIYA, Hideo; INOUE, Takafumi et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7379, issn 0277-786X, isbn 978-0-8194-7656-2 0-8194-7656-0, 1Vol, 73792A.1-7379A.9Conference Paper

Meso-scale simulation of the polymer dynamics in the formation process of line-edge roughnessMORITA, Hiroshi; DOI, Masao.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7273, issn 0277-786X, isbn 978-0-8194-7526-8 0-8194-7526-2, 727337.1-727337.8, 2Conference Paper

Remaining challenges in microlithographic optical designWILLIAMSON, David M.Proceedings of SPIE, the International Society for Optical Engineering. 2005, pp 58740N.1-58740N.12, issn 0277-786X, isbn 0-8194-5879-1, 1VolConference Paper

Advanced holographic methods in extreme ultraviolet interference lithographyTERHALLE, Bernd; LANGNER, Andreas; PÄIVÄNRANTA, Birgit et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 8102, issn 0277-786X, isbn 978-0-8194-8712-4, 81020V.1-81020V.7Conference Paper

25th European Mask and Lithography Conference (12-15 January 2009, Dresden, Germany)Behringer, Uwe F. W.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7470, issn 0277-786X, isbn 978-0-8194-7770-5 0-8194-7770-2, 1Vol, various pagings, isbn 978-0-8194-7770-5 0-8194-7770-2Conference Proceedings

Scanner-dependent Optical Proximity EffectsTYMINSKI, Jacek K; MATSUYAMA, Tomoyuki; NAKASHIMA, Toshiharu et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7274, issn 0277-786X, isbn 978-0-8194-7527-5 0-8194-7527-0, 72740U.1-72740U.9, 2Conference Paper

Computational Lithography : The New Enabler of Moore's LawSINGH, Vivek.Proceedings of SPIE, the International Society for Optical Engineering. 2008, Vol 6827, pp 68271Q.1-68271Q.5, issn 0277-786X, isbn 978-0-8194-7002-7 0-8194-7002-3, 1VolConference Paper

Micromachining technology for micro-optics and nano-optics IV (23-25 January 2006, San Jose, California, USA)Johnson, Eric G; Nordin, Gregory P; Suleski, Thomas J et al.Proceedings of SPIE, the International Society for Optical Engineering. 2006, issn 0277-786X, isbn 0-8194-6152-0, 1Vol, pagination multiple, isbn 0-8194-6152-0Conference Proceedings

Impact of Illumination on Model -Based SRAF Placement for Contact PatterningSTURTEVANT, John L; JAYARAM, Srividya; EL-SEWEFY, Omar et al.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7640, issn 0277-786X, isbn 978-0-8194-8054-5 0-8194-8054-1, 764036.1-764036.6, 2Conference Paper

Novel Fine-tuned Model-based SRAF Generation Method Using Coherence MapKODERA, Katsuyoshi; TANAKA, Satoshi; YAMAJI, Mikiyasu et al.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7640, issn 0277-786X, isbn 978-0-8194-8054-5 0-8194-8054-1, 764017.1-764017.9, 2Conference Paper

Reduction of resist charging effect by EB reticle writer EBM-7000SAITO, Masato; UGAJIN, Kunihiro; IKENAGA, Osamu et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7379, issn 0277-786X, isbn 978-0-8194-7656-2 0-8194-7656-0, 1Vol, 73791A.1-73791A.8Conference Paper

Using Templates and Connectors for Layout Pattern Minimization in 20nm and Below Technology NodesJHAVERI, Tejas K; STROJWAS, Andrzej J.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7974, issn 0277-786X, isbn 978-0-8194-8533-5, 797405.1-797405.7Conference Paper

Achieving Interferometric Double Patterning through Wafer RotationPENG XIE; LAFFERTY, Neal V; SMITH, Bruce W et al.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7640, issn 0277-786X, isbn 978-0-8194-8054-5 0-8194-8054-1, 76401Z.1-76401Z.5, 2Conference Paper

Comparison of OPC models with and without 3D-mask effectSER, Jung-Hoon; PARK, Tae-Hoon; JEONG, Moon-Gyu et al.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7640, issn 0277-786X, isbn 978-0-8194-8054-5 0-8194-8054-1, 76401T.1-76401T.6, 2Conference Paper

Characterization of the scattering effect of complex mask geometries with surface roughnessRAHIMIL, Z; ERDMANN, A; PFLAUM, C et al.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7717, issn 0277-786X, isbn 978-0-8194-8190-0 0-8194-8190-4, 1Vol, 771709.1-771709.12Conference Paper